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Fujifilm Introduces New Plates


May 25, 2010
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Fujifilm announced at Ipex this year two new plates: the Brillia HD LH-PLE plate and the Brillia HD LH-NI3. The company places the new plates in its low-chemistry family based on its compatibility with its FLH-Z ZAC processor, which the company says can reduce chemistry use by up to 75 percent.

Fujifilm calls its Brillia HD LH-PLE plate “the next generation of
high speed, high quality thermal plate.” It is aimed at the heatset web market with run lengths of up to 300,000, without baking. The plate is manufactured at the Fujifilm plate line in Tilburg using a new aluminum alloy, designed for more durable operation in long runs. The Brillia HD LH-PLE plate is completely interchangeable with
Fujifilm’s Brillia HD LH-PJE plate, printers can use the same
platesetter and processor for both with no changes required.

The Fujifilm Brillia HD LH-NI3 plate is a third generation bakeable
negative thermal plate targeted at very long run lengths for sheet-fed
and web offset applications.

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